Instruments

Laser Heating for UHV and HP Applications Description The laser beam is guided by fiber optics close to the sample holder. Temperature of the sample is controlled by close loop HEAT3-PS solution. Temperature measurement is provided by thermocouple or pyrometer. Technical Data Wavelength 808 nm (+/- nm) Fiber core diameter … Read More

Beam Flux Monitor The Beam Flux Monitor enables measurement of the equivalent pressure (BEP) in MBE applications via a Bayard Alpert ionization gauge. It is typically mounted on a linear shift/z-stage to allow the filament to be positioned near to the substrate and includes a protection shield when in the … Read More

Effusion Cell EF 40C1 EF 40C1 Effusion Cell (Knudsen Cell) is a source designed for delivering highly constant evaporation rates by indirect resistive heating at the material. Custom insertion length 114 – 380 mm (other on request). Features Extremely stable flux rates Various crucible materials Highly reproducible & reliable Suitable for … Read More

Flood Source FS 40A1 Low cost electron flood gun for charge neutralisation of insulators or semiconductors in XPS/AES and SIMS applications.The flood source operates over two energy ranges, is fully software controlled and can also be supplied with custom insertion lengths (145 – 421 mm, other on request) and shielding … Read More

Electron beam evaporator EBV 40A1 The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer thin film growth by molecular beam epitaxy. The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the … Read More

X-ray source with monochromator RMC50 New RMC50 X-ray with source monochromator is based on ellipsoidal quartz crystal and operates according to Bragg Law of X-ray diffraction. Crystal mirror has been installed on special designed independent retraction, pitch, roll mechanism to precise adjustment working position and two halogen heaters controlled via PID regulator. The monochromator … Read More

Quartz Balance QO 40A1 The Quartz Balance QO 40A1 instrument provides a real-time, progressive indication of coating thickness during deposition, allowing the production of coatings of high accuracy and reproducibility. The thickness of both evaporated and sputter coated films can be monitored. The sensor head is a water cooled, non-magnetic housing which … Read More

Electron Source ES 40C1 The ES 40C1 Electron Source is a scanable electron gun with small spot profile. Due to the high transmission of its Einzel-Lens, the ES 40C delivers a high electron beam current over a wide energy range. The ES 40C1 is designed for a stable and reliable operation in e.g. AES, scanning … Read More

Ion Source IS 40C1 The Ion Source IS 40C1 is a compact, easy-to-use extractor type ion gun for sample surface cleaning. The source generates an ion current of >70 μA/cm2 (Argon) with Gaussian beam profile. The source insertion length is adaptable to individual requirements (between 62.5 mm – 384.5 mm, other on … Read More

Ion Source IS 40E1 The IS 40E1 ion source is a two lens, extractor type, focused, differentially pumped ion gun. The source is able to raster a 10 mm x 10 mm area of the surface at the recommended working distance. It is particularly suitable for depth profiling in XPS, ISS and SIMS. … Read More