It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.
The 1-4 axis motorized sputtering manipulator is designed for sputter deposition applications under ultra-high vacuum conditions, and for reactive sputtering. Heating is performed by resistive method. The manipulator can work in the vertical orientation.
Manipulator for MBE applications:
▪ Base pressure: 10-9 mbar (working pressure: ~10-2 mbar)
The heater material is optimally adapted depending on the customer's requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).
▪ H2O cooling
▪ Side or integrated wedge shutter
▪ XY movement stage
▪ BIAS, DC ,RF
|Standard base flange||DN 100CF, DN 160CF or DN 200CF|
|Base pressure range||10-9 mbar|
|Shutter||integrated or external, pneumatic or manual|
|Heating methods||resistive, EB, direct|
|Substrate temperature||up to 1000 °C|
|Z range||50 mm (other on request)
|resolution (manual/motorised)||500 μm / standard 10 μm (1 μm on request)|
|R1 range||360° continuous|
|XY range (option)
||± 12.5 mm|
|resolution (manual/motorized)||5 μm / 1 μm|
|Max speed||up to 60 rpm (other on request)|
|Bakeout temperature||up to 150 °C|
* Stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.