1-4 Axis Sputtering Manipulators

Modular, motorized manipulator suitable for a range of R1 continuous substrate rotation and Z translation (additionally can be equipped with XY movement module).

It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.


The 1-4 axis motorized sputtering manipulator is designed for sputter deposition applications under ultra-high vacuum conditions, and for reactive sputtering. Heating is performed by resistive method. The manipulator can work in the vertical orientation.

Manipulator for MBE applications:

▪ Sample holders: plate style, PTS
▪ Base pressure: 10-9 mbar (working pressure: ~10-2 mbar)

Heater materials

The heater material is optimally adapted depending on the customer's requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).


▪ H2O cooling
▪ Side or integrated wedge shutter
▪ XY movement stage

Technical Data

Standard base flange DN 100CF, DN 160CF or DN 200CF
Base pressure range 10-9 mbar
Shutter integrated or external, pneumatic or manual
Heating methods resistive, EB, direct
Substrate temperature up to 1000 °C
Cooling method H20
Z range 50 mm (other on request)
   positional control handwheel/motorized*
   resolution (manual/motorised) 500 μm / standard 10 μm (1 μm on request)
R1 range 360° continuous
   positional control motorized*
XY range (option)
± 12.5 mm
   positional control micrometer/motorized*
   resolution (manual/motorized) 5 μm / 1 μm
Max speed up to 60 rpm (other on request)
Bakeout temperature up to 150 °C

* Stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.

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