Plasma Technology

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RF Power Supplies | RF Plasma Generators

RF (Radio Frequency) plasma generators create controlled plasma for applications like semiconductor manufacturing and material processing.

They offer precise ionization control, enabling uniform surface modifications crucial for processes such as thin-film deposition and plasma etching.

RF Matching Network

RF SUPPLIES

with Auto/manual tune and control

Princeton Scientific RF Matching Network with Auto/Manual tune and control, are designed and manufactured to be compatible with the RF generator with an output impedance of 50 ohms according to standards.

The plasma enclosure, plasma torch or other loads that require the application of RF power and have an equivalent impedance other than 50 ohms and are usually accompanied by an inductor and capacitor segment. Therefore, a system is required to change the equivalent impedance to the generator impedance level in order to prevent the reflection of the power transmitted by the generator, protect the RF generator, maximize the power input to the load, make the processes repeatable, and provide the necessary field intensity in the enclosure before and after the formation of plasma. The impedance matching network, also called the matchbox, carries out this task.

In normal situations, the matching network is built for an impedance range between 3 and 35 ohms. However, Princeton Scientific offers matching networks for various load types such as sputter guns, RIEs, loads with capacitance-inductance coupling, and complicated loads such as helicon ion sources, atmospheric ICPs with E and H modes, atmospheric plasma torches, and loads with nonstandard or unconventional impedance ranges.

The impedance matching boxes are built with both manual and automatic ability.

Automatic Impedance Matching Network
Automatic impedance matching networks made by Princeton Scientific provide adaptability for the RF generator in applications such as PECVD, HDCVD, sputtering, and Ashing. These networks use DC drive motors to perform the matching. The automatic matching system changes the plasma enclosure impedance to 50 ohms so that maximum generator power reaches the enclosure. These networks use DC drive motors to perform the matching and matching networks perform their operation in three independent modes:

  • The automatic mode continuously compensates the impedance variation of the plasma enclosure.
  • The manual mode allows the operator to change the matching capacitance values during the process.
  • In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.

The various parameters can be adjusted and observed via the front panel of the controller system and the VGA connections. One of the most important features of the impedance matching networks is the short time (approximately 2 seconds) they take to form the plasma and perform complete matching for standard loads.

Matching networks range from 300w, 1000w, 2000w, 3000w, and 5000w.

Plasma Technology 1

RF Plasma Generators 300W

RF Generators

For 2″ Magnetron Sputtering and Plasma generation

RF Generators for Sputtering and Plasma generators manufactured by Princeton Scientific are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment.

The Princeton Scientific RF generator along with its impedance matching network constitute a complete RF plasma generation assembly. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer.

Plasma Technology 2

RF Plasma Generators 600W

RF Generators

RF Generators for Sputtering and Plasma generation 100w, 200w, 300w,600w up to 5000w

RF Generators for Sputtering and Plasma generators manufactured by Princeton Scientific are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment. The Princeton Scientific RF generator along with its impedance matching network constitute a complete RF plasma generation assembly. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer.

5000W (25KV) Automatic Matching Network

RF PLASMA SUPPLIES

For RF plasma control

5000w (25KV) Automatic Matching Network for RF plasma control changes the RF Generated impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. The Princeton Scientific automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster. The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections. Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.

300W (3KV) Automatic Matching Network

RF PLASMA SUPPLIES

For RF plasma control

300w (3KV) Automatic Matching Network for RF plasma control changes the RF Generated impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. Princeton Scientific automatic matching networks perform their operation in three independent modes. The automatic mode continuously compensates the impedance variation of the plasma enclosure. The manual mode allows the operator to change the matching capacitance values during the process. In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster. The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections. Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.

3000W (15KV) Automatic Matching Network

VIEWPORTS

For RF plasma control

3000w (15KV) Automatic Matching Network for RF plasma control changes the RF Generated impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. The Princeton Scientific automatic matching networks perform their operation in three independent modes.

The automatic mode continuously compensates the impedance variation of the plasma enclosure.
The manual mode allows the operator to change the matching capacitance values during the process.
In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.

The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.

Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.
Princeton Scientific sapphire viewports are offered in CF, ISO and KF flange styles. The viewports comprise a high quality optic with precise flatness, parallelism, scratch and dig specifications. The single crystal sapphire windows have excellent optical, physical and chemical properties.

The hardest of the oxide crystals, sapphire retains its high strength at high temperatures. Sapphire has a low coefficient of thermal expansion and low fluorescence, good resistance to thermal shock and scratching making this an excellent material for IR transmitting optics and robust applications.

Plasma Technology 3

2” Magnetron Sputtering

RF Generators

GT02 and GT20

Princeton Scientific GT02 and GT20 2” magnetron sputtering sources are designed for precision thin-film deposition in advanced material research and industrial applications.

  • Compact Design: Ensures efficient utilization of chamber space while providing optimal target utilization.
  • Superior Performance: Engineered for uniform deposition, high target utilization rates, and minimized contamination.
  • Versatile Compatibility: Compatible with a wide range of materials, including metals, alloys, and ceramics.
  • Robust Construction: Built for durability and consistent performance in high-vacuum environments.

These sputtering sources are tailored to meet the needs of cutting-edge R&D facilities and production setups, delivering reliability and precision every time.

Plasma Technology 4

DC power Supplies

Magnetron Sputtering & Plasma Generation

SEM/TEM sample prep Princeton Scientific

DC power supplies for Sputtering and Plasma generators manufactured by Princeton Scientific are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting.

The Princeton Scientific high-voltage power supplies are offered in the 800-120000 V range.

An important feature of the high voltage power supplies is the low storage energy in the output stage and their small size.